Multiband Plasma-Process Monitor

The Multiband Plasma-Process Monitor (MPM) is a system specifically designed for monitoring the optical plasma emissions that are created during the various manufacturing processes of semiconductors including etching, sputtering, cleaning, and CVD. The MPM can handle multi-channel recording in rea

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HAMAMATSUHamamatsu Photonics Co.,Ltd.

濱松光子濱松光子學(xué)株式會(huì)社

Multiband Plasma-Process Monitor

The Multiband Plasma-Process Monitor (MPM) is a system specifically designed for monitoring the optical plasma emissions that are created during the various manufacturing processes of semiconductors including etching, sputtering, cleaning, and CVD. The MPM can handle multi-channel recording in real-

Hamamatsu

濱松光子

TTL HD74/HD74S Series

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HITACHIHitachi Semiconductor

日立日立公司

8-PIN SYNCHRONOUS PWM CONTROLLER

DESCRIPTION The IRU3037 controller IC is designed to provide a low cost synchronous Buck regulator for on-board DC to DC converter applications. With the migration of today’s ASIC products requiring low supply voltages such as 1.8V and lower, together with currents in excess of 3A, traditional li

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IRF

Power MOSFET(Vdss=20V, Id=12A)

Benefits ? Ultra-Low Gate Impedance ? Very Low RDS(on) ? Fully Characterized Avalanche Voltage and Current Applications ? High Frequency Isolated DC-DC Converters with Synchronous Rectification for Telecom and Industrial Use ? High Frequency Buck Converters for Computer Processor Power

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IRF